Aluminum Neodymium Sputtering targets | AlNd targets

Aluminum neodymium alloy thin Film be used in Transistor-liquid crystal display (TFT-LCD) for low-resistivity gate metal. Aluminum transition-metal alloys films are adequate for TFT-LCD fabrication because of their low resistivity and their tendency not to form hillocks during thermal processing.

 

Aluminum Neodymium Sputtering Targets – AlNd target

Composition AlNd 97/3, 98/2%, Custom-Made
Purity 99.9%, 99.99%
Shape Discs, Plate, Step, Sheet, Rectangle, Tube, Column, Custom-Made
Size Custom-Made
Application Thin Film Transistor-liquid crystal display (TFT-LCD) requires the use of low-resistivity gate metal.
Aluminumtransition-metal alloys (AI/Nd – 3 wt.% alloy) films are adequate for TFT-LCD fabrication because of their low
resistivity and their tendency not to form hillocks during thermal processing.

 

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